Optical Lithography: Here is Why By Burn J. Lin
Publisher: S.P.I.E Public.ations 2010 | 473 Pages | ISBN: 0819475602 | PDF | 29 MB
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Topics include:- Exposure Systems
- Image Formation
- The Meter of Lithography
- Components in Optical Lithography
- Processing and Optimization
- Immersion Lithography
- Outlook for optical lithography
